LITHO HT T-ESC®
(MEMBER OF THE HT T-ESC® FAMILY)
Fluid residues between substrate and carrier are avoided. In addition to the benefits offered by the standard HT T-ESC®, the Litho HT T-ESC® is an adapted solution fostering thin wafer support during the whole lithography process.
Typical Applications
- Photoresist coating
- EBR
- Baking
- Exposure
- Developing
Moreover, the following applications are supported as well
- Spin cleaning
- Spin etching
Qualified Equipment
- SUSS ACS300Plus
- SUSS MA200Compact
- SSEC3300
- Various single-wafer cleaners
|
|
